Copublished with IEE. The dynamic field of lithography demands an authoritative handbook for process development and production and to aid in the training of scientists and engineers. It contains process details, recipes, tables, charts, etc., and is useful as a reference book or as a textbook.
Contents
 - Preface - Introduction - Optical Lithography - Electron Beam Lithography - X-ray Lithography - Deep-UV Resist Technology - Photomask fabrication procedures and limitations - Metrology Methods in Photolithography - Optical Lithography Modeling - Issues in Nanolithography for Quantum Effect Device Manufacture - Index

Handbook of Microlithography, Micromachining, and Microfabrication. Volume 1: Microlithography (SPIE Press Monograph Vol. PM39)

Engineering & Transportation

Harry J. Levinson

Robert D. Allen

Mark A. McCord

Franco Cerrina

John G. Skinner

Andrew R. Neureuther

Martin C. Peckerar

F. Keith Perkins

Michael J. Rooks

Engineering

Society of Photo-Optical Instrumentation Engineers

Covers lithography process control at several levels, from fundamental through advanced topics. Self-contained tutorial works both as an introduction to the technology and as a reference for the experienced lithographer. Reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback.
Contents
 - Preface - Introduction to the use of statistical process control in lithography - Sampling - Simple and complex processes - Linewidth control - Overlay - Yield - Process drift and automatic process control - Metrology - Control of operations

Lithography Process Control (SPIE Tutorial Texts in Optical Engineering Vol. TT28)

SPIE Publications

Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
 Contents 
 - Preface 
 - Overview of lithography 
 - Optical pattern formation 
 - Photoresists 
 - Modeling and thin film effects 
 - Wafer steppers 
 - Color Plates overlay 
 - Masks and reticules 
 - Overcoming the diffraction limit 
 - Metrology 
 - The limits of optical lithography 
 - Lithography costs 
 - Alternative lithography techniques 
 - Appendix A: Coherence 
 - Index

Principles of Lithography, Second Edition (SPIE Press Monograph Vol. PM146)

Arts & Photography

Graphic Design

Product Description 
This book covers the many aspects of lithographic technology that needed to be addressed in order to make EUV lithography ready for high-volume manufacturing: exposure tools, light sources, masks, resists, process control, metrology, and computational lithography. Lithography costs, which have often influenced the areas of technical focus, are discussed. Potential improvements to current EUV technology and extensions to future nodes are also covered. Each topic is approached from the perspective of a practicing lithographer in a wafer fab, in either manufacturing or development, and there are many references at the end of each chapter. 
 Review 
The publication of Harry Levinson's Extreme Ultraviolet Lithography is very timely, now that extreme ultraviolet lithography has entered the high-volume manufacture of semiconductor devices. As a semiconductor lithographer with decades of experience, Dr. Levinson gives in his book an up-to-date account of all important and necessary aspects of this cutting-edge technology in just over 200 pages, with exhaustive references at the end of every chapter to invite the reader to explore further particular aspects of the technology. It is a must-read for every semiconductor lithography engineer and should be a rewarding experience for everyone working in the field of semiconductors. --Anthony Yen, Head of Technology Development Center, ASML 
 About the Author 
Harry J. Levinson is currently an independent lithography consultant and Principal Lithographer at HJL Lithography. He has spent most of his career working in the field of lithography, starting at AMD. He also held positions at Sierra Semiconductor and IBM before returning to AMD in 1994. When wafer operations were spun off from AMD, he moved to GLOBALFOUNDRIES and worked there until mid-2018. During the course of his career, Levinson has applied lithography to many different technologies, including bipolar memories, 64-Mb and 256-Mb DRAM development, the manufacturing of application-specific integrated circuits, thin-film heads for magnetic recording, flash memories and advanced logic. He was one of the first users of 5x steppers in Silicon Valley and was an early participant in 248-nm, 193-nm, and EUV lithography. Levinson served for several years as the chairman of the USA Lithography Technology Working Group that participated in the generation of the lithography chapter of the International Technology Roadmap for Semiconductors. He has published numerous articles on lithographic science, on topics ranging from thin-film optical effects and metrics for imaging, to overlay and process control, and he is the author of two other books: Lithography Process Control and Principles of Lithography. He holds over 70 US patents. Levinson is an SPIE Fellow, previously chaired the SPIE Publications Committee, and served on SPIE's Board of Directors. In recognition of his contributions to SPIE, he received the Society's 2014 Directors Award. He has a B.S. in engineering from Cornell University and a Ph.D. in physics from the University of Pennsylvania. His Ph.D. thesis, titled Resonances and Collective Effects in Photoemission, addressed certain phenomena involving the interactions of light and matter. For this work, he received the Wayne B. Nottingham Prize in surface science.

Extreme Ultraviolet Lithography

Science & Math

Physics

SPIE--The International Society for Optical Engineering

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