Principles of Lithography, Second Edition (SPIE Press Monograph Vol. PM146)

Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.

Contents

- Preface

- Overview of lithography

- Optical pattern formation

- Photoresists

- Modeling and thin film effects

- Wafer steppers

- Color Plates overlay

- Masks and reticules

- Overcoming the diffraction limit

- Metrology

- The limits of optical lithography

- Lithography costs

- Alternative lithography techniques

- Appendix A: Coherence

- Index