Chemical Vapor Deposition for Microelectronics: Principles, Technology, and Applications (Materials Science and Process Technology Series)

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Chemical Vapor Deposition for Microelectronics: Principles, Technology, and Applications (Materials Science and Process Technology Series) image
ISBN-10:

0815511361

ISBN-13:

9780815511366

Author(s): Sherman, Arthur
Edition: 1
Released: Jan 01, 1987
Format: Hardcover, 215 pages

Description:

Presents an extensive, comprehensive study of chemical vapor deposition (CVD). Understanding CVD requires knowledge of fluid mechanics, plasma physics, chemical thermodynamics, and kinetics as well as homogenous and heterogeneous chemical reactions. This text presents these aspects of CVD in an integrated fashion, and also reviews films for use in integrated circuit technology.

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